Helmut Fischer FISCHERSCOPE X-RAY XDV-µ SEMI – automated wafer microstructure inspection
Applications
For semiconductor manufacturing and packaging (2.5D/3D) – inspection of nanometre-scale under-bump metallisation (UBM), C4 and smaller solder bumps, and lead-free solder caps on copper pillars. The enclosed measuring environment ensures constant conditions; the instrument is suitable for cleanrooms and 24/7 operation.
Key features
- Fully automated wafer loading from FOUPs and cassettes; compatible with OHT and AGV supply
- Integrated CCTV monitoring, large service hatches
- Polycapillary optics with 10 or 20 µm FWHM measuring spots
- DPP+ – up to 50 % higher performance
- Programmable measurements based on pattern recognition
- Standardised SECS/GEM communication
Models
detector (20 / 50 mm²) and spot (10 / 20 µm) options
Technical data
- Wafers: 6, 8 and 12 in. (up to 12 in.)
- X-ray tube: “Ultra” microfocus, tungsten anode
- Detector: SDD 20 or 50 mm², Peltier cooling
- Measuring spot: 10 or 20 µm (FWHM)
- Filters: 4 interchangeable
- Stage: programmable, with vacuum wafer chuck
- Communication: SECS/GEM
- Software: WinFTM
What we offer
- Selection of the instrument and configuration for your task, together with the manufacturer
- Trial measurements of your samples in the manufacturer’s laboratory
- Training, calibration and service organised through the manufacturer
Technical data according to the manufacturer: helmut-fischer.com
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